首页> 外国专利> A TWIN INTERNAL ION SOURCE FOR PARTICLE BEAM PRODUCTION WITH A CYCLOTRON

A TWIN INTERNAL ION SOURCE FOR PARTICLE BEAM PRODUCTION WITH A CYCLOTRON

机译:用回旋双离子产生双束内部离子源

摘要

The present invention, which comprises two internal ion source (1, 2) for the generation of the same particles relates to a cyclotron. A second ion source to increase the reliability and uptime strongly cyclotron, an interruption for maintenance can be used as a spare ion source to reduce. Advantageously, the cyclotron is further characterized by an optimized close-up members of a different geometry in the central region of the cyclotron. Cyclotron of the present invention is a modification and optimization of the first internal ion source and the second shape of the internal ion source further characterized in order to avoid particle losses during the first rotation acceleration. In order to improve the acceleration of the cyclotron is between gap (5), and possible de-electrode assembly (4) of the counter may be further characterized by a shape adaptation and optimization of the di-electrode assembly. ;
机译:包括两个内部离子源(1、2)以产生相同粒子的本发明涉及回旋加速器。第二个离子源可提高回旋加速器的可靠性和正常运行时间,可以将维护中断用作备用离子源,以减少故障。有利地,回旋加速器的特征还在于回旋加速器的中心区域中具有不同几何形状的优化的近摄件。本发明的回旋加速器是对第一内部离子源和第二形状的内部离子源的修改和优化,其特征还在于,以避免在第一旋转加速期间的颗粒损失。为了提高回旋加速器的加速度在间隙(5)之间,并且计数器的可能的去电极组件(4)的特征还可以在于,对电极组件的形状适应和优化。 ;

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