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ION IMPLANTING DEVICE MAKING IONS PASS BY ARRANGING THE FIRST REGION AND THE SECOND REGION, A MASS ANALYZING DEVICE INCLUDING THE SAME AND AN ION FOCUSING METHOD USING THE SAME
ION IMPLANTING DEVICE MAKING IONS PASS BY ARRANGING THE FIRST REGION AND THE SECOND REGION, A MASS ANALYZING DEVICE INCLUDING THE SAME AND AN ION FOCUSING METHOD USING THE SAME
PURPOSE: An ion implanting device, a mass analyzing device including the same and an ion focusing method are provided to focus implanted ions in an electric field by changing a shape of a protruded electrode. ;CONSTITUTION: The second electrode(2) is arranged so that it can surround one end of the first electrode(1). The second electrode, connected to the first region(10), includes the second region(20) for passing ions. The second electrode includes a protrusion extended according to a movement direction of the ions passing through the second region. The protrusion includes a side sloped with respect to a movement direction of the ions passing through the second region. The first electrode includes the first region for passing the ions.;COPYRIGHT KIPO 2011
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