首页> 外国专利> ION IMPLANTING DEVICE MAKING IONS PASS BY ARRANGING THE FIRST REGION AND THE SECOND REGION, A MASS ANALYZING DEVICE INCLUDING THE SAME AND AN ION FOCUSING METHOD USING THE SAME

ION IMPLANTING DEVICE MAKING IONS PASS BY ARRANGING THE FIRST REGION AND THE SECOND REGION, A MASS ANALYZING DEVICE INCLUDING THE SAME AND AN ION FOCUSING METHOD USING THE SAME

机译:通过布置第一区域和第二区域来使离子注入设备通过离子,包括其的质量分析设备和使用该方法的离子聚焦方法

摘要

PURPOSE: An ion implanting device, a mass analyzing device including the same and an ion focusing method are provided to focus implanted ions in an electric field by changing a shape of a protruded electrode. ;CONSTITUTION: The second electrode(2) is arranged so that it can surround one end of the first electrode(1). The second electrode, connected to the first region(10), includes the second region(20) for passing ions. The second electrode includes a protrusion extended according to a movement direction of the ions passing through the second region. The protrusion includes a side sloped with respect to a movement direction of the ions passing through the second region. The first electrode includes the first region for passing the ions.;COPYRIGHT KIPO 2011
机译:目的:提供一种离子注入装置,包括该离子注入装置的质量分析装置以及离子聚焦方法,以通过改变突出电极的形状在电场中聚焦注入的离子。 ;构成:第二电极(2)的排列方式使其可以围绕第一电极(1)的一端。连接到第一区域(10)的第二电极包括用于使离子通过的第二区域(20)。第二电极包括根据穿过第二区域的离子的移动方向延伸的突起。突起包括相对于穿过第二区域的离子的移动方向倾斜的侧面。第一电极包括用于使离子通过的第一区域。; COPYRIGHT KIPO 2011

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