DOUBLE CATHODIC-ARC SOURCE FOR PLASMA COATING FOR INDEPENDENTLY CONTROLLING ELEMENT CONSTITUENTS

摘要

PURPOSE: A double cathodic-arc source for plasma coating is provided to improve a plasma coating speed using arc discharge and suppress droplet formed on the surface of a coating film by increasing plasma density. ;CONSTITUTION: A double cathodic-arc source(100) for plasma coating includes a main induction pipe(110), and first and second sub induction pipes(130,140). The first and second sub induction pipes are arranged symmetrically at a predetermined angle on the main induction pipe. One end of the first and second sub induction pipes is integrally connected with the main induction pipe. An air gun(120) is attached to the other end of the first and second sub induction pipes. The arc gun evaporates an arc target to generate a coating material composed of ions and electrons. The main induction pipe and each sub induction pipe comprise a plurality of electromagnets(150) which electrically control the magnetic field.;COPYRIGHT KIPO 2011