首页> 外国专利> OBJECT WITH IMPROVED SUITABILITY FOR A PLASMA CLEANING PROCESS CAPABLE OF CLEANING AN OBJECT WELL

OBJECT WITH IMPROVED SUITABILITY FOR A PLASMA CLEANING PROCESS CAPABLE OF CLEANING AN OBJECT WELL

机译:能够清理对象井的等离子清理过程的改进的对象

摘要

PURPOSE: An object with improved suitability for a plasma cleaning process is provided to reduce the number of steps for processing an object, thereby preventing an object from being contaminated again. ;CONSTITUTION: An object suitable for a plasma cleaning process is connected with a first outer surface area(SRF1) and a second outer surface area(SRF2). The object is connected to a detachable cover so that the detachable cover is connected to the object while the detachable cover covers the second outer surface area. The object connected to the detachable cover is cleaned in a plasma cleaning device so that the first outer surface area is cleaned without exposing the plasma cleaning device to the particles existing on the second outer surface area.;COPYRIGHT KIPO 2011
机译:目的:提供一种具有改进的等离子体清洁工艺适应性的物体,以减少处理物体的步骤数,从而防止物体再次受到污染。组成:适用于等离子体清洁工艺的物体与第一外表面区域(SRF1)和第二外表面区域(SRF2)连接。物体连接到可拆卸盖,使得可拆卸盖连接到物体,而可拆卸盖覆盖第二外表面区域。在等离子清洁设备中清洁了与可拆卸盖连接的物体,从而在不使等离子清洁设备暴露于第二外表面存在的颗粒的情况下清洁了第一外表面。COPYRIGHTKIPO 2011

著录项

  • 公开/公告号KR20110073348A

    专利类型

  • 公开/公告日2011-06-29

    原文格式PDF

  • 申请/专利权人 ASML NETHERLANDS B.V.;

    申请/专利号KR20100132321

  • 发明设计人 WITUSCHEK HERBERT;MAQUINE JOHANNES;

    申请日2010-12-22

  • 分类号H01L21/027;G03F7/20;

  • 国家 KR

  • 入库时间 2022-08-21 17:51:34

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