PHOTOLITHOGRAPHY DEVELOPING SOLUTION CAPABLE OF INCLUDING AT LEAST ONE SELECTED FROM TETRABUTYL AMMONIUM HYDROXIDE, AN AQUEOUS ORGANIC SOLVENT, A SURFACTANT, AND AN INCLUSION COMPOUND, A METHOD FOR FORMING RESIST PATTERNS, A METHOD FOR MANUFACTURING THE PHOTOLITHOGRAPHY DEVELOPING SOLUTION, AND AN APPARATUS FOR MANUFACTURING THE SAME

摘要

PURPOSE: A photolithography developing solution, a method for forming resist patterns, a method for manufacturing the photolithography developing solution, and an apparatus for manufacturing the same are provided to suppress the precipitation of hydroxide tetrabutyl ammonium. ;CONSTITUTION: A photolithography developing solution, which is obtained from an apparatus for manufacturing the photolithography developing solution(1), includes at least one selected from a group including tetrabutyl ammonium hydroxide, an aqueous organic solvent, a surfactant, and an inclusion compound. The content of the aqueous organic solvent is between 1 and 10 weight%. The aqueous organic solvent is polyhydric alcohol. The polyhydric alcohol is one selected from a group including ethylene glycol, propylene glycol, and glycerin. The content of the surfactant is between 0.01 and 10 weight%. The surfactant is selected from a group including cyclodextrin and crown ether.;COPYRIGHT KIPO 2011