首页> 外国专利> NITRIDE SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF CAPABLE OF EASILY FORMING MINUTE FILLERS OF A NANO SIZE ON A LIGHT EMITTING SURFACE OF THE UPPER SIDE OF AN ACTIVE LAYER

NITRIDE SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF CAPABLE OF EASILY FORMING MINUTE FILLERS OF A NANO SIZE ON A LIGHT EMITTING SURFACE OF THE UPPER SIDE OF AN ACTIVE LAYER

机译:氮化物半导体器件及其制造方法,可在有源层上表面的光发射面上形成纳米尺寸的细小颗粒填料

摘要

PURPOSE: A nitride semiconductor device and a manufacturing method thereof are provided to improve light extraction efficiency by forming a minute uneven surface on a light emitting surface with a mask pattern using a metal thin film.;CONSTITUTION: A semiconductor layer(10) including an active layer is prepared. A metal layer(20) is formed on the surface of the semiconductor layer to which light from the active layer is emitted. The surface of the metal layer becomes uneven by thermally processing the metal layer. A plurality of protrusions is formed by etching the surface of the semiconductor layer with a mask including a metal layer with a non-uniform surface. The remaining metal layer is removed and an electrode is formed on the semiconductor layer.;COPYRIGHT KIPO 2012
机译:目的:提供一种氮化物半导体器件及其制造方法,以通过使用金属薄膜在具有掩模图案的发光表面上形成微细的凹凸表面来提高光提取效率。组成:半导体层(10),包括准备有源层。在从有源层发出的光的半导体层的表面上形成金属层(20)。通过对金属层进行热处理,金属层的表面变得不平坦。通过用包括具有不均匀表面的金属层的掩模蚀刻半导体层的表面来形成多个突起。去除剩余的金属层,并在半导体层上形成电极。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR20110097005A

    专利类型

  • 公开/公告日2011-08-31

    原文格式PDF

  • 申请/专利权人 LG ELECTRONICS INC.;

    申请/专利号KR20100016611

  • 发明设计人 KANG MIN GU;

    申请日2010-02-24

  • 分类号H01L21/20;

  • 国家 KR

  • 入库时间 2022-08-21 17:51:13

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