HEAT TREATMENT APPARATUS WHICH IS HEAT TREATING A TARGET PROCESSING MATERIAL BY A HEATER, A HEAT TREATMENT METHOD, AND A STORAGE MEDIUM

摘要

PURPOSE: A heat treatment apparatus, a heat treatment method, and a storage medium are provided to suppress a thermal history change between target processing materials, thereby limiting the size of an apparatus.;CONSTITUTION: A reference voltage value is a smallest voltage value among AC voltage variations. A reference resistance value is biggest resistance value among heater(23A,23B,23C) resistance value variations. A conduction rate is maximized when a resistance value is the reference resistance and a voltage detection value is the reference voltage. A heat treatment apparatus is comprised of a temperature detecting part, a controlling part, an AC power source part, a manipulation part(34A,34B,34C), a voltage detecting part(44), and a correcting part.;COPYRIGHT KIPO 2012