METHOD FOR FABRICATING MULTIPLE-SCALE SURFACE AND SOLID SUBSTRATE WITH THE MULTIPLE-SCALE SURFACE BY THE SAME METHOD

摘要

Provided are a multi-scale surface processing method in which a micrometer-scale structure and a nanometer-scale structure are mixed, and a solid substrate having a multi-scale surface produced by the method. The multi-scale surface processing method according to the present invention comprises the steps of preparing a silicon wafer, forming a sacrificial layer having a micrometer size on the silicon wafer, and separating the silicon wafer surface into a sacrificial layer forming region and other exposed regions; After the sacrificial layer is removed, the depth-reactive ion etching in which the protective film process and the etching process are periodically repeated is performed to form a micrometer scale structure in the sacrificial layer forming region, and at the same time, the nanometers are formed in the sacrificial layer forming region and the entire exposed region. Forming nanograss on a scale.