首页> 外国专利> METHOD FOR FORMING AN ALIGNMENT LAYER PATTERN AND AN OPTICAL LAMINATE MANUFACTURED BY THE SAME CAPABLE OF ELIMINATING A MASK WITHOUT THE DAMAGE OF THE ALIGNMENT LAYER PATTERN AND A BASE FILM AFTER AN ALIGNMENT LAYER PATTERN FORMING PROCESS

METHOD FOR FORMING AN ALIGNMENT LAYER PATTERN AND AN OPTICAL LAMINATE MANUFACTURED BY THE SAME CAPABLE OF ELIMINATING A MASK WITHOUT THE DAMAGE OF THE ALIGNMENT LAYER PATTERN AND A BASE FILM AFTER AN ALIGNMENT LAYER PATTERN FORMING PROCESS

机译:形成对准层图案的方法和一种光学叠片制造方法,其在对准层图案形成过程之后,不会消除对准层图案和基底膜的损害而具有能够消除面膜的能力。

摘要

PURPOSE: A method for forming an alignment layer pattern and an optical laminate manufactured by the same are provided to form a pattern with superior dimension accuracy on an alignment layer without a photo-mask aligning process.;CONSTITUTION: An alignment layer(30) is formed on one side of a transparent base film(20). A mask film(10) is bonded to another side of the transparent base film in order to form an alignment layer pattern on the alignment layer. Light is radiated to a mask film bonding side after the mask film is bonded to the transparent base film. The mask film is eliminated. The mask film includes a material which shields light. The mask film is composed of a light shielding part(11) and a light transmitting part(12).;COPYRIGHT KIPO 2012
机译:目的:提供一种形成取向层图案的方法和由其制造的光学层压板,以在取向层上形成具有优异尺寸精度的图案,而无需进行光掩模取向处理。;组成:取向层(30)形成在透明基膜(20)的一侧上。将掩模膜(10)粘合到透明基膜的另一侧,以在取向层上形成取向层图案。在将掩模膜粘合至透明基膜之后,将光照射至掩模膜粘合侧。去除了掩膜。掩模膜包括屏蔽光的材料。掩模膜由遮光部分(11)和透光部分(12)组成。; COPYRIGHT KIPO 2012

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