METHOD FOR OPERATING AN EVAPORATOR IN THIN FILM DEPOSITION APPARATUS AND METHOD FOR DEPOSITING A THIN FILM WITHOUT OVERHANG IN A THIN FILM

摘要

PURPOSE: A method for operating an evaporator in thin film deposition apparatus and method for depositing a thin film are provided to increase the efficiency of raw material by increasing the evaporation rate of a raw material in depositing a thin film on the substrate.;CONSTITUTION: In a method for operating an evaporator in thin film deposition apparatus and method for depositing a thin film, a raw material is provided into a vaporizer in which a carrier gas is included(S100) If the vaporized raw material is discharged to a chamber, it is absorbed to the substrate of a chamber(S110). The raw material which is not absorbed to a target is purged to the outside of a chamber(S120). The vaporized raw material and the reaction gas are reacted to form a thin film(S130). The purge gas is supplied to the chamber and reaming reaction byproduct and non reaction material(S140). If thin film having a desired thickness is deposited on the substrate, a process is finished(S150).;COPYRIGHT KIPO 2012