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OVERLAY VERNIER AND METHOD FOR MEASURING AN OVERLAY CAPABLE OF IMPROVING AN OVERLAY

机译:覆盖面测量方法和用于测量覆盖面改善效果的方法

摘要

PURPOSE: An overlay vernier and a method for measuring an overlay are provided to accurately measure the overlay by collecting the measurement result of six or more overlays.;CONSTITUTION: A main scale(100) includes a long stem unit and a plurality of branch units(120). The plurality of branch units is separately extended in one direction of the stem unit and forms concave units. A sub scale(200) has the same shape as the main scale to make the branch unit of the main scale face the concave unit of the sub scale.;COPYRIGHT KIPO 2012
机译:目的:提供一种覆盖游标和测量覆盖的方法,通过收集六个或更多覆盖的测量结果来准确地测量覆盖。组成:主秤(100)包括一个长茎单元和多个分支单元(120)。多个分支单元在茎单元的一个方向上分别延伸并形成凹形单元。子标尺(200)具有与主标尺相同的形状,以使主标尺的分支单元面对子标尺的凹面单元。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR20110114856A

    专利类型

  • 公开/公告日2011-10-20

    原文格式PDF

  • 申请/专利权人 HYNIX SEMICONDUCTOR INC.;

    申请/专利号KR20100034223

  • 发明设计人 LEE HO HYUK;

    申请日2010-04-14

  • 分类号H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 17:50:53

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