首页> 外国专利> ELECTRIC CHARGED PARTICLE BEAM DRAWING DEVICE CAPABLE OF IMPORCVING LINEWIDTH UNIFORMITY AND AN ELECTRIC CHARGED PARTICLE BEAM DRAWING METHOD

ELECTRIC CHARGED PARTICLE BEAM DRAWING DEVICE CAPABLE OF IMPORCVING LINEWIDTH UNIFORMITY AND AN ELECTRIC CHARGED PARTICLE BEAM DRAWING METHOD

机译:具有改善线宽均匀性的带电粒子束拉伸装置及带电粒子束拉伸方法

摘要

PURPOSE: An electric charged particle beam drawing device and an electric charged particle beam drawing method are provided to improve correction accuracy by introducing a correction term depending on proximity effect density.;CONSTITUTION: A drawing part(150) comprises an electronics telescopic(102) and drawing room(103). An electron gun(201), an illumination lens(202), and a blanker(212) are included within the electronics telescopic. An XY stage(105) which is transferable in an XY direction is arranged within the drawing room. A sample(101) is arranged on the XY stage. A controller(160) comprises a control computing(110), a memory(112), and a deflection control circuit(120). A dosage operation unit(18), a drawing data processing unit(22), and a density operation unit(24) are arranged within the control computing.;COPYRIGHT KIPO 2012
机译:目的:提供一种带电粒子束绘制装置和一种带电粒子束绘制方法,以通过引入取决于邻近效应密度的校正项来提高校正精度。;组成:绘制部件(150)包括伸缩电子元件(102)和客厅(103)。电子枪(201),照明透镜(202)和遮挡物(212)包括在电子望远镜中。可在XY方向上移动的XY载物台(105)布置在绘图室内。样品(101)布置在XY平台上。控制器(160)包括控制计算(110),存储器(112)和偏转控制电路(120)。剂量运算单元(18),绘图数据处理单元(22)和浓度运算单元(24)布置在控制计算中。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR20110117019A

    专利类型

  • 公开/公告日2011-10-26

    原文格式PDF

  • 申请/专利权人 NUFLARE TECHNOLOGY INC.;

    申请/专利号KR20110036274

  • 发明设计人 MATSUMOTO HIROSHI;

    申请日2011-04-19

  • 分类号H01L21/027;G03F7/20;

  • 国家 KR

  • 入库时间 2022-08-21 17:50:53

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号