PLASMA CVD APPARATUS CONDUCTING SELF-CLEANING AND METHOD OF SELF-CLEANING

摘要

A plasma CVD apparatus conducting self-cleaning comprises a reaction chamber, a susceptor, a showerhead, a temperature controlling mechanism for directly controlling the temperature of the showerhead at a temperature of 200°C to 400°C, a remote plasma discharge device provided outside the reaction chamber, and a radio-frequency power source electrically connected to either of the susceptor or the showerhead.