METHOD AND SYSTEM FOR OBTAINING MASK BLANK INFORMATION, METHOD FOR PROVIDING MASK BLANK INFORMATION, METHOD FOR SUPPORTING TRANSFER MASK MANUFACTURE AND MANUFACTURING TRANSFER MASK, AND METHOD FOR MANUFACTURING AND PROVIDING MASK BLANK

摘要

-substrate with at least a transfer pattern is to include a plurality of thin film formed on the resist film on the mask blank for , in forming the pattern according to pattern data , film information to the contrast with the pattern , is acquired with respect to each of a plurality of film .