monomer , a resin and a method for manufacturing a semiconductor device using the resist composition , the resin composition using the registry and seven days

摘要

The present invention without impairing the transparency or acid-reactive required for resist, dissolution, causing contamination of the device and that there is a risk of degassing and to provide a monomer as a constituent of the resin and the resin containing sulfonium salt as a side chain containing a small side chain for the purpose of generating acid. ; to being represented by formula (1) The monomer of ; st32: che xmlns: st32 = "http://alexandria.fairviewresearch.com/ns/st32/" /st32: che ; In Formula 1, R ₁ and R ₃ is either -H groups and -CH ₃ group, may be different from each well using the same. In Formula 1, R ₂ represents either a phenyl group and an adamantyl group. In Formula 1, Q ₁ represents a perfluoroalkyl group having a carbon number of 1~4.