temperature setting of the heat-treated plate method , a computer-readable recording medium storing a program , and a temperature setting apparatus of a thermal processing plate

摘要

The soleplate of the heating unit is divided into a plurality of heating plate temperature zones can be set for each hotplate area. Each region of the heating plate , the heating plate may be a temperature correction value for adjusting the temperature of the hot plate surface , each set . The line width in the photolithography step is completed the substrate surface is measured and , the in-plane tendency of the line width is measured by using a Zernike polynomial decomposition into a plurality of in-plane tendency components . Calculated from the plurality of in-plane tendency components , the in-plane component as improved by the change tendency of the temperature compensation value is extracted and the improvement of measuring a line width in the substrate surface these are combined is calculated as the in-plane tendency . Only if the amount of improvable in-plane tendency exceeds the threshold value set in advance , is set in the temperature correction value for each area of the hot plate heating plate changes .