首页> 外国专利> TREATMENT AND REUSE SYSTEM FOR WASTEWATER CONTAINING HIGH CONCENTRATIONS OF HYDROFLUORIC ACID, PHOSPHORIC ACID AND NITRIC ACID

TREATMENT AND REUSE SYSTEM FOR WASTEWATER CONTAINING HIGH CONCENTRATIONS OF HYDROFLUORIC ACID, PHOSPHORIC ACID AND NITRIC ACID

机译:高浓度氢氟酸,磷酸和硝酸的废水处理及回用系统

摘要

The present invention relates to a method and apparatus for treating and recycling wastewater containing high concentrations of hydrofluoric acid, phosphoric acid, and nitric acid generated in the semiconductor industry and the metal industry, and more particularly, comprising two chemical reactors and a bioreactor. Treatment of hydrofluoric acid, phosphoric acid, and nitric acid is carried out in sequence, and dehydration efficiency is provided by installing a dehydration device between the two chemical reaction tanks to dehydrate the treated water and sludge discharged from the sedimentation tank of the second chemical reaction tank together. It is possible to omit one precipitation tank installed at the rear end of the first chemical reaction tank, and to add the acetic acid as a neutralizer to the second chemical reaction tank to lower the TDS of the incoming water introduced into the biological reaction tank, and to remove residual acetic acid from the bioreactor. By utilizing as an organic source, not only can the methanol injection amount be reduced, but also the reverse osmosis That can reduce and relates to a high-concentration hydrofluoric acid, waste water treatment and recycling apparatus including phosphoric acid and nitric acid.
机译:本发明涉及一种用于处理和再循环在半导体工业和金属工业中产生的含有高浓度氢氟酸,磷酸和硝酸的废水的方法和设备,更具体地说,其包括两个化学反应器和一个生物反应器。依次进行氢氟酸,磷酸和硝酸的处理,并且通过在两个化学反应槽之间安装脱水装置以使从第二化学反应的沉淀槽排出的处理后的水和污泥脱水,来提供脱水效率。一起坦克。可以省略一个沉淀池,该沉淀池安装在第一化学反应池的后端,并且可以向第二化学反应池中添加乙酸作为中和剂,以降低引入生物反应池的进水的TDS,并从生物反应器中去除残留的乙酸。通过用作有机源,不仅可以减少甲醇的注入量,而且可以减少反渗透,可以减少甲醇的注入,涉及一种高浓度的氢氟酸,包括磷酸和硝酸的废水处理和再循环设备。

著录项

  • 公开/公告号KR101065940B1

    专利类型

  • 公开/公告日2011-09-19

    原文格式PDF

  • 申请/专利权人 GREEN ENTECH CO. LTD.;

    申请/专利号KR20100133818

  • 发明设计人 SIM HYUN SEOK;KIM WON YOUNG;

    申请日2010-12-23

  • 分类号C02F1/52;C02F3;C02F1/58;C02F1/463;

  • 国家 KR

  • 入库时间 2022-08-21 17:49:46

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