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Method for the production of a coating having antireflexion layer on a movable substrate by a plasma-enhanced chemical vapor deposition, comprises providing a gas mixture having process-, carrier- and/or balance gas through a slit
Method for the production of a coating having antireflexion layer on a movable substrate by a plasma-enhanced chemical vapor deposition, comprises providing a gas mixture having process-, carrier- and/or balance gas through a slit
The method for the production of a coating having antireflexion layer on a movable substrate (30) by a plasma-enhanced chemical vapor deposition (PECVD), comprises providing a gas mixture having process-, carrier- and/or balance gas through a slit formed between two high-voltage electrodes (20) and producing plasma between a self-moving substrate that is supported by a counter electrode (50), and the high-voltage electrode. The plasma presets a plasma zone with standard, where the plasma is processed at atmospheric pressure and/or approximate atmospheric pressure. The method for the production of a coating having antireflexion layer on a movable substrate (30) by a plasma-enhanced chemical vapor deposition (PECVD), comprises providing a gas mixture having process-, carrier- and/or balance gas through a slit formed between two high-voltage electrodes (20) and producing plasma between a self-moving substrate that is supported by a counter electrode (50), and the high-voltage electrode. The plasma presets a plasma zone with standard, where the plasma is processed at atmospheric pressure and/or approximate atmospheric pressure and a volume dose of the plasma of 2x 10 5to 2x 10 7Ws/m 3is kept in the plasma zone. The plasma zone is worked with dielectric barrier discharge. The gas speed of the gas mixture is selected so that a time spent of the plasma in the plasma zone is 5-500 ms. The PECVD process is carried out so that the plasma zone comprises a pre-ionization area with decreased deposition rate and deposition area and the pre-ionization is partially carried out in gap. A reflection reduction is achieved to 2.5% in a wavelength range of 200 nm per coated substrate surface related to the uncoated substrate. The substrate has a reflexion reduction of 2.5% in the range of 300-1000 nm. A further layer is deposited on a layer that forms antireflexion layer. A layer influencing the wetting of the surface is deposited as a further layer. A layer improving the scraper stability of the surface is deposited as a further layer. The glass is float glass or cast glass. The substrate is optical transparent plastic. An independent claim is included for an antireflexion coating on a substrate.
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