Saturator for introducing water-soluble gases into a water to be treated, comprises a pressure container, which has lower liquid chamber and upper gas chamber, where the gas chamber is provided with compressed gas inlet and water inlet

摘要

The saturator (10) comprises a pressure container (11), which has a lower liquid chamber (12) and an upper gas chamber (13), where the gas chamber is provided with a compressed gas inlet and a water inlet (16) and the liquid chamber is provided with a water outlet. The gas chamber contains a water-guiding structure, to which the water runs along under the formation of a water film, below the water inlet. The water-guiding structure forms a path, which is longer than the height of the gas chamber, and has plates that are arranged one upon the other and are connected by vertical struts. The saturator (10) comprises a pressure container (11), which has a lower liquid chamber (12) and an upper gas chamber (13), where the gas chamber is provided with a compressed gas inlet and a water inlet (16) and the liquid chamber is provided with a water outlet. The gas chamber contains a water-guiding structure, to which the water runs along under the formation of a water film, below the water inlet. The water-guiding structure forms a path, which is longer than the height of the gas chamber, and has plates that are arranged one upon the other and are connected by vertical struts. The plates form passage openings, through which the water reaches from an upper floor into a lower floor and which are alternatively arranged at the circumference and in the center of the adjacent plate. The water inlet is aligned to the uppermost plate, and is tangentially arranged to the pressure container. The water-guiding structure has a helical surface, and consists of filler body for obtaining a large wetted surface. The struts are arranged around a vertical center axis of the plate. A water processing system forms the saturator together with a cavitation device provided behind the water outlet and a floatator.