Micro mirror arrangement for forming pupil in lighting system utilized for microlithography, has anti-reflex coating with absorbing layer made of non-metallic material whose absorption coefficient and wavelength are set as specific value

摘要

The arrangement has a micro mirror (3) with a reflecting surface (11) that is formed at a mirror substrate (2) made of silicon, and an anti-reflex coating (7). The coating is formed at the mirror substrate outside of the reflecting surface. The coating has an absorbing layer (7a) made of non-metallic material whose absorption coefficient is greater than or equal to 0.4 and the wavelength within the UV range is 193 Newton meter. The absorbing layer is made of silicon nitride or silicon oxide nitride. An independent claim is also included for a method for producing an anti-reflex coating.