Method for forming lattice structure at extreme UV mirror, involves applying coating on surface of substrate, and treating surface with radiation, for forming lattice structure by radiation-induced compacting of substrate

摘要

The method involves applying a reflecting coating (5) on a surface (3) of a substrate (4), and treating the surface of the substrate with electromagnetic radiation (2) e.g. X-ray or extreme UV radiation, for forming a lattice structure (10) by radiation-induced compacting of the substrate. A silica glass i.e. quartz glass, doped with titanium dioxide, or glass ceramic with thermal expansion coefficients of less than preset value is selected as a material for the substrate. The reflecting coating is formed from different materials by a number of alternating mirror layers (6).