首页> 外国专利> TREATING LIQUID FOR ANALYSIS OF HIGH PURITY ORGANOMETALLIC COMPOUND AND ANALYSIS METHOD OF TRACE IMPURITY USING THE TREATING LIQUID, AND HIGH PURITY ORGANOMETALLIC COMPOUND THROUGH THE ANALYSIS

TREATING LIQUID FOR ANALYSIS OF HIGH PURITY ORGANOMETALLIC COMPOUND AND ANALYSIS METHOD OF TRACE IMPURITY USING THE TREATING LIQUID, AND HIGH PURITY ORGANOMETALLIC COMPOUND THROUGH THE ANALYSIS

机译:用于分析高纯有机化合物的处理液和使用该处理液的痕量杂质的分析方法,以及通过该分析的高纯有机化合物

摘要

PROBLEM TO BE SOLVED: To provide a treating liquid for analysis of a high purity organometallic compound suitable for using in analysis of trace decomposition impurities of a high purity organometallic compound; and also an analysis method of trace impurities in a high purity organometallic compound using the treating liquid.;SOLUTION: The problems to be solved in the present invention is solved by a treating liquid for analysis of a high purity organometallic compound having a metal concentration of 0.001 to 1 mass% by using an aqueous acidic solution after decomposition treatment of the high purity organometallic compound with an aqueous inorganic acid solution and an organic solvent.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:提供一种用于分析高纯度有机金属化合物的处理液,该处理液适用于分析高纯度有机金属化合物的痕量分解杂质; ;解决方案:本发明要解决的问题是通过一种用于分析金属浓度为的高纯度有机金属化合物的处理液解决的。在高纯度有机金属化合物经无机酸水溶液和有机溶剂分解处理后,通过使用酸性水溶液在0.001至1质量%范围内;版权所有:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP2012093320A

    专利类型

  • 公开/公告日2012-05-17

    原文格式PDF

  • 申请/专利权人 UBE IND LTD;

    申请/专利号JP20100242884

  • 发明设计人 YAMANAKA EIJI;MIYAJI CHIHIRO;

    申请日2010-10-29

  • 分类号G01N31/00;G01N27/62;

  • 国家 JP

  • 入库时间 2022-08-21 17:43:41

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