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The measuring method which measures the form of suffering inspection ones, being the measuring method which measures the form of aforementioned suffering inspection ones making use of the interference fringes

机译:测量受灾检查件的形式的测量方法是利用干涉条纹测量上述受灾检查件的形式的测量方法

摘要

PROBLEM TO BE SOLVED: To provide an interference measuring method which can measure an aspherical shape by simple processing.;SOLUTION: The measuring method measuring the shape of a specimen using interference fringes obtained by reference light from a reference surface and light from the specimen comprises: steps S103 to S105 for converting a first interference fringe into a first shape of the specimen; steps S107, S108 for acquiring a second interference fringe at a position at which the specimen has moved in the direction of an optical axis; a step S109 for aligning the phases of the first and second interference fringes at a standard point with each other and unwrapping the second interference fringe; a step S110 for converting the unwrapped second interference fringe into a second shape of the specimen; a step S111 for determining whether or not the first shape and the second shape of the specimen match; and a step S112 for, when determined that they do not match, adding an integral multiple of the wavelength of a light source to the unwrapped second interference fringe to calculate the shape of the specimen.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种干涉测量方法,该干涉测量方法可以通过简单的处理来测量非球面形状;解决方案:该测量方法使用通过从参考表面的参考光和从样品的光获得的干涉条纹来测量样品的形状,该方法包括: :步骤S103至S105,用于将第一干涉条纹转换为样本的第一形状;步骤S107,S108,用于在被检体沿光轴方向移动的位置获取第二干涉条纹。步骤S109,将第一干涉条纹和第二干涉条纹的相位在标准点上对准,并展开第二干涉条纹。步骤S110,将未包裹的第二干涉条纹转换为样品的第二形状;步骤S111,判断被检体的第一形状和第二形状是否一致。步骤S112,当确定它们不匹配时,将光源波长的整数倍加到展开的第二干涉条纹上,以计算出样品的形状。版权所有:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP5053833B2

    专利类型

  • 公开/公告日2012-10-24

    原文格式PDF

  • 申请/专利权人 キヤノン株式会社;

    申请/专利号JP20070341369

  • 发明设计人 山添 賢治;大島 裕貴;

    申请日2007-12-28

  • 分类号G01B11/24;

  • 国家 JP

  • 入库时间 2022-08-21 17:41:27

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