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Liquefied gas supply device using the vaporization method liquefied gas, vaporizer and

机译:使用气化方法的液化气供应装置,液化气,气化器和

摘要

PROBLEM TO BE SOLVED: To provide a vaporizing method for liquefied gas, a vaporizing device and a liquefied gas supply device, stably supplying liquefied gas in a gas phase to gas consumption equipment, and having high energy efficiency, and high function.;SOLUTION: This liquefied gas supply device includes: a heat medium supply part 6 for controlling the temperature of a heat medium and circulating and supplying the heat medium; a space part 1c disposed in contact with the bottom 1a and the outer peripheral part 1b of a filling container 1; a heating part 5 disposed in a space close to the bottom 1a of the space part 1c or disposed in the interior of a heat medium inlet pipe 4 provided in the space; and a control part for controlling the above parts, wherein both in the state of supplying liquefied gas and in the state of stopping the supply, the control part controls the control temperature and the supply flow of the heat medium in the heat medium supply part 6 and the heating value added to the heating part 5, and adjusts the gas phase pressure in the filling container 1 to be higher than the saturated vapor pressure of liquefied gas at the controlled temperature of the heat medium.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种液化气的汽化方法,汽化装置和液化气供应装置,能够稳定地将气相的液化气供给至气体消耗设备,并且具有高能量效率和高性能。该液化气供给装置包括:热介质供给部6,该热介质供给部6控制热介质的温度并循环供给。与填充容器1的底部1a和外周部1b接触配置的空间部1c。加热部5配置在靠近空间部1c的底部1a的空间内,或者配置在设于该空间内的热介质导入管4的内部。以及控制这些部分的控制部,其中,在供给液化气的状态和停止供给的状态下,控制部均控制热介质供给部6中的热介质的控制温度和供给流量。在加热介质的控制温度下,将填充容器1中的气相压力调整为高于液化气的饱和蒸气压。并且,将填充在加热部5中的热量增加到加热部5。日本特许厅

著录项

  • 公开/公告号JP4999605B2

    专利类型

  • 公开/公告日2012-08-15

    原文格式PDF

  • 申请/专利权人 日本エア・リキード株式会社;

    申请/专利号JP20070217553

  • 发明设计人 横木 和夫;

    申请日2007-08-23

  • 分类号F17C7/04;F17C13;

  • 国家 JP

  • 入库时间 2022-08-21 17:41:07

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