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For forming the inorganic resist pattern, a method of manufacturing an optical disk master manufacturing method for manufacturing method and optical disk substrate of an optical disk stamper

机译:为了形成无机抗蚀剂图案,制造光盘原盘的方法和光盘压模的光盘基板的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing an inorganic resist pattern in which the taper angle of a pattern projecting part can be arbitrarily adjusted.;SOLUTION: The method for manufacturing the inorganic resist pattern comprises a step of forming an inorganic resist layer 3 composed of a metal oxide on a substrate 1, a step of forming a latent image 3a of a prescribed shape by irradiating the inorganic resist layer 3 with a laser beam 3b, and a step of forming the rugged pattern of the inorganic resist layer 3 in which the portion formed with the latent image 3a is a recessed part on the substrate 1 by developing the inorganic resist layer 3. The taper angle θ of the projecting shape of the rugged pattern is controlled by the amount of the oxygen included in the metal oxide. In concrete terms, the taper angle θ of the pattern projecting shape can be formed smaller (gentler) by reducing the amount of the oxygen included in the metal oxide, and the taper angle of the pattern projecting shape can be formed greater (steeper) by increasing the amount of the oxygen.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种可任意调节图案突出部的锥角的无机抗蚀剂图案的制造方法。解决方法:无机抗蚀剂图案的制造方法包括形成无机抗蚀剂层的步骤。参照图3,在基板1上形成由金属氧化物构成的图3所示的工序;通过对无机抗蚀剂层3照射激光3b而形成规定形状的潜像3a的步骤;以及形成无机抗蚀剂层3的凹凸图案的步骤。通过使无机抗蚀剂层3显影,形成有潜像3a的部分为基板1上的凹部。凹凸图案的凸出形状的大小通过金属氧化物中所含的氧的量来控制。具体而言,锥角θ为0。通过减少金属氧化物中所含的氧的量,可以使图案凸出形状的锥度变小(柔顺),并且通过增加氧的量可以使图案凸出形状的锥角变大(更陡峭)。版权:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP4954638B2

    专利类型

  • 公开/公告日2012-06-20

    原文格式PDF

  • 申请/专利权人 ソニー株式会社;

    申请/专利号JP20060223674

  • 发明设计人 斉藤 則之;安達 則夫;

    申请日2006-08-18

  • 分类号G11B7/26;G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-21 17:39:39

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