首页> 外国专利> RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND RELIEF PRINTING PLATE AND PROCESS FOR MAKING SAME

RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND RELIEF PRINTING PLATE AND PROCESS FOR MAKING SAME

机译:激光雕刻用树脂组合物,激光雕刻用的凸版印刷版原版及其生产工艺,以及相同的浮雕板和制备工艺

摘要

PROBLEM TO BE SOLVED: To provide a resin composition for laser engraving that gives a relief printing plate having excellent chemical resistance and that has excellent removability of engraving residue, a relief printing plate precursor using the resin composition for laser engraving, a process for making a relief printing plate using the precursor, and a relief printing plate obtained thereby.;SOLUTION: The resin composition includes: (Component A) a filler having an ethylenically unsaturated group; (Component B) a polymerizable compound having an ethylenically unsaturated group; and (Component C) a polymerization initiator.;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:提供一种用于激光雕刻的树脂组合物,其提供具有优异的耐化学性并且具有优异的雕刻残渣去除性的凸版印刷版,使用该激光雕刻用树脂组合物的凸版印刷版原版,解决方案:树脂组合物包括:(组分A)具有烯键式不饱和基团的填料;和包含所述前体的凸版印刷版。 (成分B)具有烯键式不饱和基团的聚合性化合物。 COPYRIGHT:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP2012066415A

    专利类型

  • 公开/公告日2012-04-05

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORP;

    申请/专利号JP20100211381

  • 发明设计人 YAMAMOTO OSAO;

    申请日2010-09-21

  • 分类号B41N1/12;B41C1/05;C08F292/00;C08F2/44;C08F290/12;

  • 国家 JP

  • 入库时间 2022-08-21 17:39:34

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