Light shielding material, method for producing light shielding material, ultraviolet absorbing film, infrared absorbing film, photomask, and electromagnetic wave shielding film

摘要

A light shielding member having an excellent surface hardness, a manufacturing method thereof, an ultraviolet absorption film, an infrared absorption film, a photo mask, and an electromagnetic wave shielding film are provided to improve a surface hardness and a light shielding performance of a light fastness etc by forming a light shielding member including a polymer layer by a surface graft polymerization. A compound having an unsaturated part and a part absorbing a metal ion or a metal salt is contacted on a member capable of generating a radical by a light. A polymer layer coupled on the member is generated by performing an exposure process. A metal ion or a metal salt is supplied to the polymer layer. A metal particle is educed by reducing the metal ion among the metal ion and the metal salt. One among a multivalent metal cross-linking process, a chemical modification, and an acid process is performed about a metal salt structure of one valence.