Ratio of the opening hole for the cubic measure which consists of the sintered body of manufacturing method null zinc oxide subject of the target and the manufacturing method,

摘要

PROBLEM TO BE SOLVED: To provide a target which gives a zinc oxide-based electroconductive film having uniformity and high performance in an ion plating method while suppressing the generation of splash or without generating splash, and to provide a useful method for manufacturing the same.;SOLUTION: The target for forming the zinc oxide-based electroconductive film comprises a sintered compact mainly containing zinc oxide and is characterized in that the volume ratios of open and closed pores to the volume obtained from the external shape are 15-40% and ≤3.0%, respectively, and the generation of splash is inhibited during ion plating.;COPYRIGHT: (C)2007,JPO&INPIT