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Coating method for manufacturing or reprocessing sputter targets and x-ray anodes
Coating method for manufacturing or reprocessing sputter targets and x-ray anodes
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机译:用于制造或后处理溅射靶材和X射线阳极的涂层方法
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摘要
In various embodiments, large-area sputtering targets are formed by providing a plurality of sputtering targets each comprising a backing plate and a refractory metal layer disposed thereon, and spray depositing a refractory metal powder on an interface between the sputtering targets, the refractory metal powder consisting essentially of the same metal as each refractory metal layer, thereby joining the refractory metal layers of the sputtering targets.
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