首页> 外国专利> Semiconductor materials and material removal system detection system for detecting the solid material in the plasma

Semiconductor materials and material removal system detection system for detecting the solid material in the plasma

机译:半导体材料和材料去除系统检测系统,用于检测等离子体中的固体材料

摘要

A method for solid material detection in a medium includes receiving an exhaust gas downstream with respect to a workpiece from which a photoresist material is removed. An electromagnetic circuit is configured to include the exhaust gas, the exhaust gas is excited with electromagnetic energy and an impedance value of the electromagnetic circuit is determined, wherein the impedance value corresponds to an amount of solid material within the exhaust gas.
机译:一种用于在介质中检测固体材料的方法,该方法包括在相对于工件去除了光致抗蚀剂材料的工件下游接收废气。电磁回路被构造成包括废气,废气被电磁能激发并且确定电磁回路的阻抗值,其中该阻抗值对应于废气中的固体材料的量。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号