首页> 外国专利> Making Method of Sample for Evaluation of Laser Irradiation Position and Making Apparatus Thereof and Evaluation Method of Stability of Laser Irradiation Position and Evaluation Apparatus Thereof

Making Method of Sample for Evaluation of Laser Irradiation Position and Making Apparatus Thereof and Evaluation Method of Stability of Laser Irradiation Position and Evaluation Apparatus Thereof

机译:激光照射位置的评价用样品的制作方法及其装置,激光照射位置的稳定性的评价方法及其装置

摘要

A method for making a sample for evaluation of laser irradiation position and evaluating the sample, and an apparatus which is switchable between a first mode of modification of semiconductor and a second mode of making and evaluating the sample. Specifically, a sample is made by irradiating a semiconductor substrate for evaluation with a pulse laser beam while the semiconductor substrate is moved for evaluation at an evaluation speed higher than a modifying treatment speed, each relative positional information between pulse-irradiated regions in the sample is extracted, and stability of the each relative positional information between pulse-irradiated regions is evaluated. The evaluation speed is such a speed that separates the pulse-irradiated regions on the sample from each other in a moving direction.
机译:一种用于评估激光照射位置并评估样本的样本的方法,以及一种可在半导体改性的第一模式与样本的制备与评估的第二模式之间切换的装置。具体地,通过以高于修改处理速度的评估速度移动半导体基板以进行评估的同时用脉冲激光束照射用于评估的半导体基板来制成样本,样本中的脉冲照射区域之间的每个相对位置信息为提取,并且评估脉冲照射区域之间的每个相对位置信息的稳定性。评估速度是这样的速度,其将样本上的脉冲照射区域在移动方向上彼此分离。

著录项

  • 公开/公告号US2012184055A1

    专利类型

  • 公开/公告日2012-07-19

    原文格式PDF

  • 申请/专利权人 RYUSUKE KAWAKAMI;MIYUKI MASAKI;

    申请/专利号US201213428297

  • 发明设计人 MIYUKI MASAKI;RYUSUKE KAWAKAMI;

    申请日2012-03-23

  • 分类号H01L21/66;H01L21/26;

  • 国家 US

  • 入库时间 2022-08-21 17:34:19

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