首页> 外国专利> METHOD AND SYSTEM FOR RAMAN, FLUORESCENCE, LITHOGRAPHIC, STIMULATED EMISSION AND PHOTOCHEMICAL IMAGING BEYOND THE DIFFRACTION LIMIT

METHOD AND SYSTEM FOR RAMAN, FLUORESCENCE, LITHOGRAPHIC, STIMULATED EMISSION AND PHOTOCHEMICAL IMAGING BEYOND THE DIFFRACTION LIMIT

机译:衍射极限以外的拉曼,荧光,石印,光发射和光化学成像的方法和系统

摘要

Systems and methods for hyper-resolution beyond the diffraction limit of optical microscopes for applications in spectroscopy, absorption and lithographic photochemical patterning are described. These systems are based on interference of a pump pulse and a Stokes laser pulse which interfere to localize the population of an excited vibrational state in an area that is smaller than the scanning resolution of the microscope. Another (interfering) Stokes pulse has an annular shape at focus and destructively interferes with the the Stokes laser pulse. This destructive interference causes narrowing of the population distribution of the vibrational excited state well below the diffraction limit, which in turn localizes the population of the central electronic excited state by a separate actinic laser pulse having a lower energy than the ground state excitation energy of the molecule.;A stepped photolithography system uses two photomasks to produce photoresist images capable of printing features smaller than 10 nm.
机译:描述了用于光谱学,吸收和光刻光化学图案化中的超出光学显微镜的衍射极限的超分辨率的系统和方法。这些系统基于泵浦脉冲和斯托克斯激光脉冲的干扰,它们会干扰将激发振动状态的总体定位在小于显微镜扫描分辨率的区域。另一个(干扰)斯托克斯脉冲在焦点处具有环形形状,并与斯托克斯激光脉冲相消地干涉。这种破坏性干涉导致振动激发态的总体分布变窄,远低于衍射极限,这又通过一个单独的光化激光脉冲将中心电子激发态的总体定位在局部,该单独的光化激光脉冲的能量低于激光的基态激发能。步进光刻系统使用两个光掩模来产生能够打印小于10 nm的特征的光刻胶图像。

著录项

  • 公开/公告号US2012069332A1

    专利类型

  • 公开/公告日2012-03-22

    原文格式PDF

  • 申请/专利权人 ROBERT D. FRANKEL;

    申请/专利号US201113236994

  • 发明设计人 ROBERT D. FRANKEL;

    申请日2011-09-20

  • 分类号G01J3/44;G21K5/00;G01J3/30;G01N21/64;

  • 国家 US

  • 入库时间 2022-08-21 17:32:33

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