首页> 外国专利> Heat Resistant Piezo Bimorph Synthetic Jet Apparatus

Heat Resistant Piezo Bimorph Synthetic Jet Apparatus

机译:耐热压电双压电晶片合成射流装置

摘要

A heat resistant piezo bimorph synthetic jet apparatus comprises a working fluid chamber partially defined by a plate, a working fluid port that provides fluid flow communication between the working fluid chamber and a working fluid mass, and a bimorph piezoelectric structure included in the plate. The bimorph piezoelectric structure alternately increases and decreases chamber volume by alternately expanding convexly and concavely in response to application of voltage of alternating polarity to alternately draw working fluid into and expel working fluid from the working fluid chamber through the working fluid port. A thermal insulating layer is disposed between the working fluid chamber and the bimorph piezoelectric structure to protect a ceramic layer within the first bimorph piezoelectric structure from high temperature working fluid.
机译:耐热压电双压电晶片合成喷射装置包括:工作流体腔室,其部分地由板限定;工作流体端口,其在工作流体腔室与工作流体质量之间提供流体流动连通;以及双压电晶片压电结构,其包括在板上。双压电晶片压电结构响应于交替极性的电压的施加,通过交替地凸出和凹入地交替地增大和减小腔室容积,以交替地通过工作流体端口将工作流体吸入工作流体腔并从工作流体腔排出工作流体。绝热层设置在工作流体腔室与双压电晶片压电结构之间,以保护第一双压电晶片压电结构中的陶瓷层免受高温工作流体的影响。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号