Method for double-dip substrate spin optimization of coated micro array supports

摘要

Described is a method for preparing a substrate-coated support for use in micro-array devices. The method comprises the steps of applying a first coat of substrate to a support, making the substrate coating ramp by subjecting the coated support to centripetal forces, adding a second coat of substrate to the resulting support having a ramping planar coat, and subjecting the coated support to centripetal forces for a second time to produce a substrate-coated membrane in which the thickness of the substrate layer is uniform across the entire coated surface.