首页> 外国专利> System and method for providing enhanced background rejection in thick tissue with differential-aberration two-photon microscopy

System and method for providing enhanced background rejection in thick tissue with differential-aberration two-photon microscopy

机译:利用差像差双光子显微镜在厚组织中提供增强的背景排斥的系统和方法

摘要

A system for providing enhanced background rejection in thick tissue contains an aberrating element for introducing controllable extraneous spatial aberrations in an excitation beam path; at least one mirror capable of directing received laser pulses to the aberrating element; an objective; a beam scanner imaged onto a back aperture of the objective so that the beam scanner steers beam focus within the thick tissue; and a detector for recording signals produced by the tissue. An associated method comprises the steps of acquiring two-photon excited fluorescence of thick tissue without extraneous aberrations; introducing an extraneous aberration pattern in an excitation beam path; acquiring two-photon excited fluorescence of the thick tissue having the introduced extraneous aberration pattern; and subtracting the two-photon excited fluorescence with extraneous aberrations from the acquired standard two-photon excited fluorescence of the thick tissue without extraneous aberrations.
机译:一种用于在厚组织中提供增强的背景排斥的系统,包括一个像差元件,用于在激发光束路径中引入可控制的无关空间像差。至少一个反射镜,能够将接收到的激光脉冲导向像差元件;目标成像在物镜后孔上的光束扫描仪,使光束扫描仪在厚组织内引导光束聚焦;检测器用于记录组织产生的信号。一种相关的方法包括以下步骤:在没有外部像差的情况下获取厚组织的双光子激发荧光;在激发光束路径中引入无关的像差图案;获得具有引入的外部像差图案的厚组织的双光子激发荧光;从获得的没有组织像差的厚组织的标准双光子激发荧光中减去具有外像差的双光子激发荧光。

著录项

  • 公开/公告号US8198604B2

    专利类型

  • 公开/公告日2012-06-12

    原文格式PDF

  • 申请/专利权人 JEROME MERTZ;

    申请/专利号US20080240074

  • 发明设计人 JEROME MERTZ;

    申请日2008-09-29

  • 分类号G01N21/64;

  • 国家 US

  • 入库时间 2022-08-21 17:30:31

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