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Range pattern definition of susceptibility of layout regions to fabrication issues

机译:布局区域对制造问题的敏感性的范围模式定义

摘要

A memory is encoded with a data structure that represents a pattern having a range for one or more dimensions and/or positions of line segments therein. The data structure identifies two or more line segments that are located at a boundary of the pattern. The data structure also includes at least one set of values that identify a maximum limit and a minimum limit (i.e. the range) between which relative location and/or dimension of an additional line segment of the pattern in a portion of a layout of an integrated circuit (IC) chip, represents a defect in the IC chip when fabricated. In most embodiments, multiple ranges are specified in such a range defining pattern for example a width range is specified for the width of a trace of material in the layout and a spacing range is specified for the separation distance between two adjacent traces in the layout.
机译:用数据结构编码存储器,该数据结构表示具有在其中线段的一个或多个尺寸和/或位置的范围的图案。数据结构标识位于图案边界处的两个或多个线段。数据结构还包括至少一组值,这些值标识最大极限和最小极限(即范围),在最大极限和最小极限之间,在集成布局的一部分中图案的附加线段的相对位置和/或尺寸。电路(IC)芯片代表制造时IC芯片中的缺陷。在大多数实施例中,在这样的范围限定图案中指定多个范围,例如,为布局中的材料迹线的宽度指定宽度范围,并且为布局中的两个相邻迹线之间的间隔距离指定间隔范围。

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