首页> 外国专利> Process for preparing a membrane gas separation membrane comprises a microporous layer, of su00eclica doped by boron, the appropriate membrane for gas separation, the use of a membrane and nuclear installation

Process for preparing a membrane gas separation membrane comprises a microporous layer, of su00eclica doped by boron, the appropriate membrane for gas separation, the use of a membrane and nuclear installation

机译:制备膜气体分离膜的方法包括由硼掺杂的,的微孔层,用于气体分离的合适膜,膜的使用和核装置

摘要

Process for preparing a membrane gas separation membrane comprises a microporous layer, of su00eclica doped by boron, the appropriate membrane for gas separation, the use of a membrane and nuclear installation.The present invention has for object a process for the preparation of a gas separation membrane, which comprises depositing a film from a sol of silica on a porous support, and the heat treatment of the film thus deposited.In the sun of silica deposited is prepared hidrolisando a alcu00f3xido of silicon in the presence of a quantity of dopant of a precursor of an oxide of a trivalent element, in particular, boron or aluminum.The present invention is, still, the membranes such as obtained according to this process, and their uses, in particular for the separation of helium or hydrogen at high temperature, and particularly for the removal of impurities in the flow of helium.
机译:制备膜气体分离膜的方法包括微孔层,该微孔层掺杂有硼的s,用于气体分离的合适膜,膜的使用和核装置。本发明的目的是提供一种制备膜气体分离膜的方法。气体分离膜,其包括将二氧化硅溶胶的膜沉积在多孔载体上,并对由此沉积的膜进行热处理。在沉积的二氧化硅的阳光下,在一定量的存在下制备硅的hidrolisando alc alc三价元素的氧化物,特别是硼或铝的氧化物的前体的掺杂剂。本发明仍然是根据该方法获得的膜,以及它们的用途,特别是用于分离氦或氢在高温下,特别是用于除去氦气流中的杂质。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号