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Method of revealing crystalline faults in a massive substrate

机译:揭示块状基底中晶体缺陷的方法

摘要

method of revealing crystal defects existing in the prior hidden in a silicon substrate, and there are massive later if this substrate is used in a process of collection and report of layers and recycled at least three times.;this process is remarkable in that it includes a step consisting in:- submit the solid substrate to a heat treatment to "revelation", carried out in a non reducing atmosphere, at a temperature between 500 and 1300.
机译:揭示隐藏在硅基板中的先验晶体缺陷的方法,如果将该基板用于层的收集和报告过程中并至少循环使用三遍,则以后的工作量将更大。步骤包括:-使固体基质在非还原性气氛中于500至1300之间的温度下进行“揭露”热处理。

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