Ion beam processing system with a beam space-charge compensation device

摘要

The present invention provides for a beam space-charge compensation device which is applied to an angular energy filter (17) provided in an ion beam processing system that performs processing by irradiating onto a wafer (19) with an ion beam. The beam space-charge compensation device comprises a plasma shower (10) provided in a beam-guiding chamber (23) of the angular energy filter and the plasma shower comprises an arc chamber (10-4) having a filament (10-3) for generating thermo-electrons for plasma. The arc chamber comprises an extraction hole (10-5) for extracting the therm-electrons and the plasma shower is arranged such that the extraction hole is located on lines of magnetic force, perpendicular to an ion beam advancing direction, of the magnetic field and that a centre axis of the filament and a center axis of said extraction hole coincide with the lines of magnetic force, perpendicular to the ion beam advancing direction, of the magnetic field.