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LASER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, METHOD FOR CONTROLLING THE LASER APPARATUS, AND METHOD FOR GENERATING THE EXTREME ULTRAVIOLET LIGHT
LASER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, METHOD FOR CONTROLLING THE LASER APPARATUS, AND METHOD FOR GENERATING THE EXTREME ULTRAVIOLET LIGHT
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机译:激光装置,极紫外光产生系统,控制激光装置的方法和产生极紫外光的方法
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摘要
A laser apparatus may include : a master oscillator configured to output a pulsed laser beam at a repetition rate, the master oscillator including at least one semiconductor laser apparatus; at least one amplifier configured to amplify the pulsed laser beam from the master oscillator, the at least one amplifier being configured to include at least one gain bandwidth; and a controller for controlling a parameter affecting an output wavelength of the pulsed laser beam from the master oscillator such that a wavelength chirping range of the pulsed laser beam from the master oscillator overlaps at least a part of the at least one gain bandwidth.
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