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SILICA GLASS WITH SATURATED INDUCED ABSORPTION AND METHOD OF MAKING

机译:饱和诱导吸收的二氧化硅玻璃及其制造方法

摘要

A silica glass article, such as a lens in a stepper/scanner system, having saturated induced absorption at wavelengths of less than about 250 nm. Saturated induced absorption is achieved by first removing SiO defects in the silica glass by forming silicon hydride (SiH) at such defects, and loading the silica glass with hydrogen to react with E centers formed by photolysis of SiH in the silica glass article. The silicon hydride is formed by loading the silica glass with molecular hydrogen at temperatures of at least 475° C. After formation of SiH, the silica glass is loaded with additional molecular hydrogen at temperatures of less than 475° C.
机译:石英玻璃制品,例如步进/扫描仪系统中的透镜,在小于约250 nm的波长处具有饱和感应吸收。饱和的感应吸收是通过首先在二氧化硅玻璃上通过在缺陷处形成氢化硅(SiH)来消除二氧化硅玻璃中的SiO缺陷,然后向二氧化硅玻璃中加载氢使其与由SiH进行光解而形成的E中心反应而实现的。通过在至少475°C的温度下向二氧化硅玻璃加载分子氢来形成氢化硅。在形成SiH之后,在低于475°C的温度下向二氧化硅玻璃加载额外的分子氢。

著录项

  • 公开/公告号EP2456726A2

    专利类型

  • 公开/公告日2012-05-30

    原文格式PDF

  • 申请/专利权人 CORNING INC.;

    申请/专利号EP20100736946

  • 发明设计人 SMITH CHARLENE M;SCHIEFELBEIN SUSAN L;

    申请日2010-07-23

  • 分类号C03B19/14;C03C3/06;C03C3/04;C03C23;

  • 国家 EP

  • 入库时间 2022-08-21 17:12:34

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