PHOTO-RESIST COMPOSITION FOR MANUFACTURING A PROBE ARRAY AND A METHOD FOR MANUFACTURING THE PROBE ARRAY USING THE SAME CAPABLE OF DEPROTECTING A FUNCTIONAL GROUP USING RELATIVELY LOW EXPOSING ENERGY

摘要

PURPOSE: A photo-resist composition for manufacturing a probe array and a method for manufacturing the probe array using the same are provided to include an onium salt-containing photoacid generating agent and a photo-sensitive agent reactive to i-line light.;CONSTITUTION: A photo-resist composition for manufacturing a probe array includes an onium salt-containing photoacid generating agent and a photo-sensitive agent reactive to i-line light. The onium salt includes sulfonate cation part represented by chemical formula 1 and sulfonate anion part represented by chemical formula 2. In the chemical formula 1, the A, the B, and the C are respectively hydroxyl group, cyclo group, and cycloalkyl group. In the chemical formula 2, the n is between 1 and 3. The X includes C3 to C10 cyclogroup, adamantyl group, and oxygen containing cycloheptane group.;COPYRIGHT KIPO 2012