首页> 外国专利> METHOD FOR ARRAY SUBSTRATE FOR A LIQUID CRYSTAL DISPLAY DEVICE CAPABLE OF PREVENTING THE DANGER BY THE OVERHEAT BY AN CHAIN DECOMPOSITION REACTION OF A HYDROGEN PEROXIDE

METHOD FOR ARRAY SUBSTRATE FOR A LIQUID CRYSTAL DISPLAY DEVICE CAPABLE OF PREVENTING THE DANGER BY THE OVERHEAT BY AN CHAIN DECOMPOSITION REACTION OF A HYDROGEN PEROXIDE

机译:能够通过过氧化氢的链分解反应防止过热的危险的液晶显示装置的基质材料的方法

摘要

PURPOSE: A method for array substrate for a liquid crystal display device is provided to minimize the amount of hydrogen peroxide in an etchant composition and control the concentration of the copper ion with in the etchant.;CONSTITUTION: A gate electrode is formed in the top of a substrate. A gate insulating layer is formed in the top of the substrate. A semiconductor layer is formed on a gate isolation layer. A source/drain electrode is formed on a semiconductor layer. A pixel electrode is connected to the drain electrode. A etching solution composition includes ammonium oxalate 6~10 weight%, hydrogen peroxide 0.1~10 weight%, and the water of the remaining amount about the total weight of composition.;COPYRIGHT KIPO 2012
机译:目的:提供一种用于液晶显示装置的阵列基板的方法,以最小化蚀刻剂组合物中过氧化氢的量并控制蚀刻剂中铜离子的浓度。;组成:在顶部形成栅电极基材的数量。在衬底的顶部中形成栅绝缘层。在栅极隔离层上形成半导体层。源/漏电极形成在半导体层上。像素电极连接到漏极。蚀刻溶液组合物包括6〜10重量%的草酸铵,0.1〜10重量%的过氧化氢和残留量约占组合物总重量的水。COPYRIGHTKIPO 2012

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