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CURRENT METHOD BASED MICRO-ION SELECTIVE ELECTRODE MANUFACTURING METHOD CAPABLE OF REDUCING A RESISTANCE VOLTAGE DROP, A CURRENT METHOD BASED MICRO-ION SELECTIVE ELECTRODE, AND AN ELECTROCHEMICAL ION CONCENTRATION MEASUREMENT METHOD USING THE SAME
CURRENT METHOD BASED MICRO-ION SELECTIVE ELECTRODE MANUFACTURING METHOD CAPABLE OF REDUCING A RESISTANCE VOLTAGE DROP, A CURRENT METHOD BASED MICRO-ION SELECTIVE ELECTRODE, AND AN ELECTROCHEMICAL ION CONCENTRATION MEASUREMENT METHOD USING THE SAME
PURPOSE: A current method based micro-ion selective electrode manufacturing method, a current method based micro-ion selective electrode, and an electrochemical ion concentration measurement method using the same are provided to increase profitability and convenience by forming a hole with an injection needle in a manufacturing process, thereby easily measuring ion concentration by measuring current in a steady-state.;CONSTITUTION: A current method based micro-ion selective electrode manufacturing method is comprised of the following procedures. An elliptic hole is formed on a transparent synthetic resin film(10) with a thickness of 5 to 20m using an injection needle in order to manufacture an ion selective film An organic gel(20) is manufactured by mixing a polyvinyl chloride solution, an ion sensing material, and an organic solvent. The organic gel of 5 to 15l is applied on one surface of the ion selective film and solidified for 4 to 8 hours at room temperature.;COPYRIGHT KIPO 2012
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