CHARGED PARTICLE BEAM WRITING DEVICE AND CHARGED PARTICLE BEAM WRITING METHOD CAPABLE OF CORRECTING RESIST HEATING

摘要

PURPOSE: A charged particle beam writing device and a charged particle beam writing method are provided to write a pattern with a precise dimension by suppressing the dimension variation of the pattern due to resist heating.;CONSTITUTION: A TD total charge calculating unit(58) calculates a total charge amount of charged particle beams in a minimum deflection area. A TD representative temperature producing unit(62) produces a representative temperature of the minimum deflection area. An irradiation quantity modulating unit(66) modulates an irradiation quantity of the minimum deflection area by inputting the irradiation quantity of the minimum deflection area and using the representative temperature of the minimum deflection area. A writing unit(150) writes a pattern in the minimum deflection area with the modulated irradiation quantity by using a deflector(212).;COPYRIGHT KIPO 2012