APPARATUS FOR PLASMA IMPEDANCE MATCHING FOR MINIMIZING REFLECTED POWER BY EFFICIENTLY PERFORMING PLASMA IMPEDANCE MATCHING AND A METHOD THEREOF

摘要

PURPOSE: An apparatus for plasma impedance matching and a method thereof are provided to minimize poor substrate processing by minimizing reflected power.;CONSTITUTION: An apparatus for plasma impedance matching is arranged between a radio frequency power supply(2110) supplying high frequency power and a processing chamber(2160) processing substrate by plasma. The apparatus for plasma impedance matching includes an impedance matching apparatus(2210) and a controller(2250). The apparatus for plasma impedance matching matches impedance between a processing chamber(2160) and the radio frequency power supply by using a variable capacity. The impedance matching apparatus is connected to a high frequency transmission line(2120). The impedance matching apparatus includes a first variable capacity(2220) and a second variable capacity(2240). The first variable capacity includes a capacitor(2221) and a driving device(2223).;COPYRIGHT KIPO 2012