COMPOSITION CONTAINING BASIC REACTIVE COMPONENTS AND A PHOTO-LITHOGRAPHY PROCESS CAPABLE OF REDUCING THE GENERATION OF DEFECTS SUCH AS BLOB DEFECTS

摘要

PURPOSE: A composition containing basic reactive components and a photo-lithography process are provided to reduce resist materials leached into leachate in contact with a resist layer during an immersion lithography process.;CONSTITUTION: A photoresist composition is applied on a substrate. The photoresist composition includes one or more resins, photo-active components, and one or more materials which are different from the resins. The materials include one or more basic reactive groups and one or more polar groups which are different from the basic reactive groups. The photoresist layer on the substrate is immersion-exposed to active radioactive ray for the photoresist composition. The exposed photoresist layer is developed based on an aqueous alkali developer such that the basic reactive groups provide one or more polar groups.;COPYRIGHT KIPO 2012