首页> 外国专利> Apparatus for Efficiently Accelerating Electron Beam through Forming Increase Structure of Plasma Density

Apparatus for Efficiently Accelerating Electron Beam through Forming Increase Structure of Plasma Density

机译:通过形成增加等离子体密度的结构有效加速电子束的装置

摘要

PURPOSE: An apparatus for efficiently accelerating electron beams by increasing plasma density is provided to prevent the limitation of electronic energy causing dephasing by efficiently increasing the electronic energy. CONSTITUTION: A gas discharge unit(501) of a ring shape surrounds a through hole(503) in which a center portion is empty. The gas discharge unit receives gas through a symmetrical gas inlet(504). The received gas is sprayed through the gas discharge unit surrounding the through hole. Lasers travel toward a perpendicular direction of a nozzle for the through hole in an overlap region of the sprayed gas. Plasma density increases to the nozzle. The gas received through the gas inlet is sprayed through the gas discharge unit of the ring shape surrounding the through hole.
机译:目的:提供一种通过增加等离子体密度来有效地加速电子束的装置,以防止通过有效地增加电子能量来限制引起相移的电子能量。组成:一个环形的排气装置(501)包围一个通孔(503),其中中心部分是空的。气体排放单元通过对称的气体入口(504)接收气体。所接收的气体通过围绕通孔的排气单元喷射。激光在喷射气体的重叠区域中朝通孔喷嘴的垂直方向传播。血浆密度增加到喷嘴。通过进气口接收的气体通过围绕通孔的环形气体排出单元喷射。

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