SUBSTRATE CLEANING APPARATUS, A SUBSTRATE CLEANING METHOD, MANUFACTURING EQUIPMENT OF A DISPLAY DEVICE, AND A MANUFACTURING METHOD USING THE SAME CAPABLE OF REDUCING TIMER FOR REPAIR WORKING BY PREVENTING THE ABSORPTION OF CONTAMINATION PARTICLES ON A ROTARY BRUSH

摘要

PURPOSE: A substrate cleaning apparatus, a substrate cleaning method, manufacturing equipment of a display device, and a manufacturing method using the same are provided to reduce residual contamination particles by supplying cleaning solution containing micro bubbles charged negatively to a brush and a substrate.;CONSTITUTION: A substrate cleaning apparatus(1) comprises a carrying apparatus(2), a rotary brush(3), and a first cleaning solution feeding unit(6). The carrying apparatus delivers substrates(9). The rotary brush is made from materials charged with the rubbing with a substrate to the minus. The rotary brush removes the residual contamination particles on a substrate by being contacted with a substrate and rotated. The first cleaning solution feeding unit supplies cleaning solution to the rotary brush.;COPYRIGHT KIPO 2012