PHOTO-SENSITIVE RESIN COMPOSITION, PATTERNS FORMED BY THE SAME, AND A DISPLAY DEVICE INCLUDING THE SAME CAPABLE OF OVERCOMING DEVELOPMENT STAINS

摘要

PURPOSE: A photo-sensitive resin composition, patterns formed by the same, and a display device including the same are provided to improve the resolution of patterns and to efficiently use the pattern as a color filter.;CONSTITUTION: A photo-sensitive resin composition includes a resin, a polymerizable compound represented by chemical formula 1, and a photopolymerization initiator with a structure represented by chemical formula 2. In chemical formula 1, R1 is a hydrogen atom or a methyl group; X is a single bond, -((CH_2)_k)O-, -(CH_2CH_2O)_l-, -(CH_2CH(CH_3)O)_m-, -(CH_2CH(OH)CH_2O)_n-; k, m, and n are 1 to 14; and l is the integer of 2 to 15. The photo-sensitive resin composition further includes (meta)acrylate monomer with five or more (meta)acryl groups in one molecule.;COPYRIGHT KIPO 2013